Ion-induced effective surface diffusion in ion sputtering
- 10 November 1997
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 71 (19) , 2800-2802
- https://doi.org/10.1063/1.120140
Abstract
Ion bombardment is known to enhance surface diffusion and affect the surface morphology. To quantify this phenomenon we calculate the ion-induced diffusion constant and its dependence on the ion energy, flux and angle of incidence. We find that ion bombardment can both enhance and suppress diffusion and that the sign of the diffusion constant depends on the experimental parameters. The effect of ion-induced diffusion on ripple formation and roughening of ion-sputtered surfaces is discussed and summarized in a morphological phase diagram.Comment: 4 pages, LaTeX, 3 ps figureKeywords
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This publication has 25 references indexed in Scilit:
- Anisotropic Kuramoto-Sivashinsky Equation for Surface Growth and ErosionPhysical Review Letters, 1995
- Dynamic Scaling of Ion-Sputtered SurfacesPhysical Review Letters, 1995
- Submicron-scale surface roughening induced by ion bombardmentPhysical Review Letters, 1991
- A new universality class for kinetic growth: One-dimensional molecular-beam epitaxyPhysical Review Letters, 1991
- Growth with Surface DiffusionEurophysics Letters, 1990
- Ion beam enhanced epitaxial growth of Ge (001)Applied Physics Letters, 1990
- Theory of ripple topography induced by ion bombardmentJournal of Vacuum Science & Technology A, 1988
- On self-turbulization of a laminar flameActa Astronautica, 1979
- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969
- Theory of Thermal GroovingJournal of Applied Physics, 1957