Selective low pressure chemical vapour deposition of tungsten: Deposition kinetics, selectivity and film properties
- 1 August 1989
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 175, 55-60
- https://doi.org/10.1016/0040-6090(89)90808-0
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- The Kinetics of LPCVD Tungsten Deposition in a Single Wafer ReactorJournal of the Electrochemical Society, 1986
- Selective Low Pressure Chemical Vapor Deposition of TungstenJournal of the Electrochemical Society, 1984
- Kinetics of Tungsten Deposition by the Reaction of WF 6 and HydrogenJournal of the Electrochemical Society, 1978