Sintered aerosol masks for dry-etched quantum dots
- 13 June 1994
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 64 (24) , 3293-3295
- https://doi.org/10.1063/1.111314
Abstract
We report on a sintering step in producing ultra-fine silver aerosol particles to serve as etch masks for semiconductor quantum-dot structures. Our experiments found heating conditions that reshape the Ag particles, resulting in a spherical shape and very good size uniformities. Using this improved aerosol generation technology, we have dry etched InP columns with 24±5 nm diameter and with very good uniformity, with nearly every aerosol particle resulting in a column. Column arrays with a density as high as 3×109 cm−2 could be produced.Keywords
This publication has 4 references indexed in Scilit:
- Generation of monodisperse Ag- and NaCl-aerosols with particle diameters between 2 and 300 nmPublished by Elsevier ,2003
- Fabrication of quantum dot structures using aerosol deposition and plasma etching techniquesJournal of Vacuum Science & Technology A, 1993
- Nanometer patterning of InP using aerosol and plasma etching techniquesApplied Physics Letters, 1992
- Studies of Quantum Dots Fabricated by Combining Aerosol and Plasma Etching TechiquesMRS Proceedings, 1992