Deep-submicron trench profile control using a magnetron enhanced reactive ion etching system for shallow trench isolation
- 1 May 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 16 (3) , 1502-1508
- https://doi.org/10.1116/1.581177
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
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