A new CVD technique for the preparation of transparent conducting films
- 1 July 1979
- journal article
- Published by Elsevier in Surface Science
- Vol. 86, 230-237
- https://doi.org/10.1016/0039-6028(79)90399-6
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Mechanism of CVD Thin Film SnO2 FormationJournal of the Electrochemical Society, 1978
- Tin dioxide films prepared by dc sputtering from a pressed powder targetJournal of Vacuum Science and Technology, 1977
- Optical and electrical properties of SnO2 thin films in relation to their stoichiometric deviation and their crystalline structureThin Solid Films, 1977
- Highly Conductive, Transparent Films of Sputtered In[sub 2−x]Sn[sub x]O[sub 3−y]Journal of the Electrochemical Society, 1972