Electron Attachment to SF6
- 1 September 1970
- journal article
- research article
- Published by AIP Publishing in The Journal of Chemical Physics
- Vol. 53 (5) , 2000-2004
- https://doi.org/10.1063/1.1674280
Abstract
The attachment rate for electrons to SF6 has been measured between 293 and 523°K in a helium‐buffered flowing afterglow over the pressure range of 0.1–1.5 torr. The attachment has a rate constant of 2.2 × 10−7 cm3/sec, independent of temperature and pressure. The primary reaction product over the measured range of temperatures is SF6−. However, the rate of production of SF5− increases rapidly with temperature.Keywords
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