Chemical vapor deposition of Ge on Si from GeH4—He gas mixtures
- 1 September 1981
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 54 (3) , 600-601
- https://doi.org/10.1016/0022-0248(81)90521-2
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- Heteroepitaxial Silicon Growth Using SiH4 in Helium‐Hydrogen AtmospheresJournal of the Electrochemical Society, 1979
- Low-Temperature Epitaxial Growth of Single Crystalline Silicon from SilaneJournal of the Electrochemical Society, 1969