Struktur zur messung von flächenwiderständen beim planarverfahren
- 31 May 1969
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 12 (5) , 407-408
- https://doi.org/10.1016/0038-1101(69)90097-5
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Analysis of the Impurity Atom Distribution Near the Diffusion Mask for a Planar p-n JunctionIBM Journal of Research and Development, 1965
- Resistivity of Bulk Silicon and of Diffused Layers in SiliconBell System Technical Journal, 1962