A comparison of the E-beam and UV-sensitivities and relative O2- plasma stabilities of organosilicon polymers.Part II. Lithographic characteristics of polysilphenylene siloxanes and some organic polymers with pendant silyl groups
- 1 December 1987
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 6 (1-4) , 511-518
- https://doi.org/10.1016/0167-9317(87)90081-5
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Polysiloxanes for deep UV lithographyMicroelectronic Engineering, 1985
- Exactly alternating silarylene–siloxane polymers. I. The synthesis and stability of bis(1,1-tetramethylene-3-phenylureido)dimethylsilaneJournal of Applied Polymer Science, 1980
- Synthesis of bis(organochlorosilyl) derivatives of aromatic hydrocarbons and of tristrichlorosilylbenzeneRussian Chemical Bulletin, 1964