Computer simulation of carrier transport in planar doped barrier diodes
- 1 March 1983
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 42 (5) , 439-441
- https://doi.org/10.1063/1.93963
Abstract
The operation of planar doped barrier diodes is studied using a numerical device simulation which solves the carrier energy transport equation self-consistently with the current continuity equation and Poisson’s equation. This allows the effects of space-charge injection and carrier heating, which have been neglected in previous studies of these devices, to be studied quantitatively. Results for two different doping profiles are presented and compared with the results calculated using the conventional quasi-equilibrium transport model. Significant differences between the results are found, demonstrating the importance of including hot-carrier effects in modeling these devices.Keywords
This publication has 5 references indexed in Scilit:
- Onset of diffusion-drift emission regime and the transition from exponential to linear current-voltage characteristic of triangular barrier semiconductor structuresApplied Physics Letters, 1982
- Charge injection over triangular barriers in unipolar semiconductor structuresApplied Physics Letters, 1981
- Planar-doped barriers in GaAs by molecular beam epitaxyElectronics Letters, 1980
- Diffusion of Hot and Cold Electrons in Semiconductor BarriersPhysical Review B, 1962
- Effective Range Analysis of-WaveReactionsPhysical Review B, 1962