Numerical simulations of microwave plasma reactors for diamond CVD
- 1 September 1995
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 74-75, 221-226
- https://doi.org/10.1016/0257-8972(95)08232-8
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Plasma enhanced chemical vapor deposition modelingSurface and Coatings Technology, 1991
- Rotationally symmetrical electric fields and electron density distributions in a microwave plasma used in optical fibre productionJournal of Physics D: Applied Physics, 1989
- Wave propagation and diagnostics in argon surface-wave discharges up to 100 TorrJournal of Physics D: Applied Physics, 1987