Measurements of Beam Potentials and Surface Voltages on Semiconductor Wafers Using an Ion Spectrometer
- 1 January 1993
- book chapter
- Published by Elsevier
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Charging measurement and control in high-current implantersNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1991
- An in situ study of the reactive ion beam etching of tungsten with tetrafluoromethane/argon mixtures using ion scattering spectroscopy and secondary ion mass spectrometryJournal of Vacuum Science & Technology A, 1990
- Measurements of space charge compensation of ion beamsVacuum, 1984