A study of the oxidation of tantalum nitride by ellipsometry and auger electron spectroscopy
- 30 June 1976
- journal article
- Published by Elsevier in Surface Science
- Vol. 56, 482-487
- https://doi.org/10.1016/0039-6028(76)90469-6
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Selected area and in-depth auger analysis of thin filmsThin Solid Films, 1973
- Parameter-Correlation and Computational Considerations in Multiple-Angle Ellipsometry*Journal of the Optical Society of America, 1971
- Thermal Oxidation of Sputtered Tantalum Thin Films between 100° and 525°CJournal of Applied Physics, 1969