Anisotropic oxidation of germanium
- 1 August 1977
- journal article
- Published by Springer Nature in Czechoslovak Journal of Physics
- Vol. 27 (8) , 943-950
- https://doi.org/10.1007/bf01588943
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Ellipsometric liquid immersion method for the determination of all the optical parameters of the system: Nonabsorbing film on an absorbing substrateSurface Science, 1969
- The kinetics and pressure dependence of surface controlled metal oxidation reactionsSurface Science, 1969
- Optical constants of germanium by ellipsometryPhysics Letters A, 1969
- Determination of the optical constants and thickness of a thin slightly absorbing film by ellipsometric measurementCzechoslovak Journal of Physics, 1969
- Ellipsometric Method for the Determination of All the Optical Parameters of the System of an Isotropic Nonabsorbing Film on an Isotropic Absorbing Substrate Optical Constants of Silicon*Journal of the Optical Society of America, 1969
- Thin oxide films on germaniumCzechoslovak Journal of Physics, 1968
- Kinetics of oxide film growth on metal crystals—IIJournal of Physics and Chemistry of Solids, 1963
- Kinetics of oxide film growth on metal crystals—I.Journal of Physics and Chemistry of Solids, 1963
- Measurement of the thickness and refractive index of very thin films and the optical properties of surfaces by ellipsometryJournal of Research of the National Bureau of Standards Section A: Physics and Chemistry, 1963
- Space Charge in Growing Oxide FilmsThe Journal of Chemical Physics, 1963