Entstehung von Eigen‐Zwischengitteratomen beim chemisch‐mechanischen Polieren von Silizium
- 1 January 1978
- journal article
- research article
- Published by Wiley in Crystal Research and Technology
- Vol. 13 (6) , 721-727
- https://doi.org/10.1002/crat.19780130615
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- On the growth of stacking faults and dislocations induced in silicon by phosphorus predepositionJournal of Applied Physics, 1977
- Formation of stacking faults and enhanced diffusion in the oxidation of siliconJournal of Applied Physics, 1974
- Defects in Quenched SiliconPhysica Status Solidi (b), 1969
- Quenched‐in Levels in p‐Type SiliconPhysica Status Solidi (b), 1967
- Quenched-In Defects in p-Type SiliconJournal of Applied Physics, 1964