Predictions of ion energy distributions and radical fluxes in radio frequency biased inductively coupled plasma etching reactors
- 1 March 1996
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 79 (5) , 2275-2286
- https://doi.org/10.1063/1.361152
Abstract
No abstract availableThis publication has 27 references indexed in Scilit:
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