Growth of InGaAs/InP quantum well structures by low-pressure metalorganic chemical vapor deposition
- 31 May 1992
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 18 (1-2) , 75-88
- https://doi.org/10.1016/0167-9317(92)90123-9
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
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