Antiphase domains in GaAs grown by metalorganic chemical vapor deposition on silicon-on-insulator

Publisher Website
Google Scholar
Abstract
Distinct antiphase domain structures in GaAs epitaxial layers grown on a Si/SiO2/Si‐substrate structure by metalorganic chemical vapor deposition have been revealed by using a silicon etchant (HF/HNO3). The antiphase is characterized by the [011]‐oriented etching textures which rotate 90° between adjacent domains. The corresponding lattice rotation is further confirmed by a convergent beam electron diffraction technique. The size of the antiphase domains is found to increase with increasing film thickness and to grow upon annealing at temperatures above 700 °C. The maximum size of the domain, however, is found to be limited by the film thickness. The majority of the domain boundary lines revealed by chemical etching on the (100) surface do not correspond to any crystalline orientation. Only small segments are found to orient along [011], [010], [021], and, occasionally, [031] and [041] directions. Cross‐sectional transmission electron microscopy studies confirmed that the boundaries are generally in curved configurations or zigzag configurations constituted of (011), (010), and (121) planes. All the boundaries are initiated at the interface and propagate through the film in the growth direction. Diffraction contrast experiments show a stacking‐faultlike contrast of intrinsic type, indicating an inward relaxation of the lattice planes at the boundary. The rapid chemical reaction of the boundary with the silicon etchant, the intrinsic nature of the lattice distortion at the boundary, and the curved configuration of the boundary indicate that the boundary atoms are replaced by Si atoms. The higher concentration of Si atoms at the antiphase boundary has further been verified by energy dispersive x‐ray analysis. In view of the reduction of bond distortion energy, the segregation of Si atoms at the antiphase boundary eliminates the highly distorted GaGa and AsAs bonds and is, therefore, an energetically favorable process. The possible antiphase boundary structure and a mechanism for its migration are discussed. Spatially resolved photoluminescence and cathodoluminescence studies reveal that both the antiphase boundaries and the defective interfacial regions contain nonradiative recombination centers. The luminescence efficiency of the domains increases strongly after annealing.