Observation of bulk tantalum oxide formation below 35 K

15 March 1987

journal article
research article
Published by American Physical Society (APS) in Physical Review B

Vol. 35 (8) , 3740-3744
https://doi.org/10.1103/physrevb.35.3740

Abstract

This paper describes the observation of bulk oxide formation near 35 K in a region where thermal diffusion cannot account for the oxide formation of bulk oxide. The data are discussed in terms of the Mott tunneling theory of oxidation, which is one of the explanations of low-temperature oxidation which emphasizes an electric-field-assisted diffusion mechanism.

Keywords

This publication has 13 references indexed in Scilit:

Core-level shifts and oxidation states of Ta and W: Electron spectroscopy for chemical analysis applied to surfaces
Physical Review B, 1984
The adsorption and condensation of oxygen on aluminium at low temperaturf
Surface Science, 1979
Molecular Photodetachment Spectrometry. II. The Electron Affinity of $O_{2}$ and the Structure of $O_{2}^{-}$
Physical Review A, 1972
Low-temperature oxidation
Oxidation of Metals, 1970
Kinetics of Oxide Film Growth on Metal Crystals: Electron Tunneling and Ionic Diffusion
Physical Review B, 1967
Theory of the oxidation of metals
Reports on Progress in Physics, 1949
The theory of the formation of protective oxide films on metals.—III
Transactions of the Faraday Society, 1947
The theory of the formation of protective oxide films on metals, II
Transactions of the Faraday Society, 1940
A theory of the formation of protective oxide films on metals
Transactions of the Faraday Society, 1939
Cohesion at a crystal surface
Transactions of the Faraday Society, 1928