Stress in Sputtered Films of Near-Equiatomic TiNiX on (100) Si: Intrinsic and Extrinsic Stresses and Their Modification by Thermally Activated Mechanisms
- 1 July 2001
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 186 (1) , 17-39
- https://doi.org/10.1002/1521-396x(200107)186:1<17::aid-pssa17>3.0.co;2-t
Abstract
No abstract availableKeywords
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