Iron contamination in silicon technology
Top Cited Papers
- 1 May 2000
- journal article
- review article
- Published by Springer Nature in Applied Physics A
- Vol. 70 (5) , 489-534
- https://doi.org/10.1007/s003390051074
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Application of Total Reflection X-Ray Fluorescence Analysis for Metallic Trace Impurities on Silicon Wafer SurfacesPublished by ASTM International ,1989
- Catastrophic breakdown in silicon oxides: The effect of Fe impurities at the SiO2-Si interfaceJournal of Applied Physics, 1987