X-ray lithography, where it is now, and where it is going
- 1 July 1990
- journal article
- Published by Springer Nature in Journal of Electronic Materials
- Vol. 19 (7) , 699-709
- https://doi.org/10.1007/bf02655238
Abstract
No abstract availableKeywords
This publication has 27 references indexed in Scilit:
- The effects of X-rays on p-n junction leakage currentsIEEE Transactions on Electron Devices, 1989
- Fully scaled 0.5 μm metal–oxide semiconductor circuits by synchrotron x-ray lithography: Mask fabrication and characterizationJournal of Vacuum Science & Technology B, 1988
- Mechanical characterization of membranes for x-ray lithography masksJournal of Vacuum Science & Technology B, 1988
- Alignment errors from resist coating topographyJournal of Vacuum Science & Technology B, 1988
- X‐Ray Damage Considerations in MOSFET DevicesJournal of the Electrochemical Society, 1986
- Low Energy X‐Ray and Electron Damage to IGFET Gate InsulatorsJournal of the Electrochemical Society, 1984
- Repetitively pulsed-plasma soft x-ray sourceApplied Optics, 1984
- The Effects of Pressure, Temperature, and Time on the Annealing of Ionizing Radiation Induced Insulator Damage in N‐channel IGFET'sJournal of the Electrochemical Society, 1983
- Stationary anode x-ray source for the evaluation of conventional resistsJournal of Vacuum Science and Technology, 1981
- Sensitive chlorine‐containing resists for X‐ray lithographyPolymer Engineering & Science, 1977