Study of the electronic trap distribution at the SiO/sub 2/-Si interface utilizing the low-frequency noise measurement
- 1 July 1990
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 37 (7) , 1743-1749
- https://doi.org/10.1109/16.55763
Abstract
No abstract availableThis publication has 37 references indexed in Scilit:
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