Vertical-Type Amorphous-Silicon Field-Effect Transistors with Small Parasitic Elements
- 1 September 1986
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 25 (9A) , L798
- https://doi.org/10.1143/jjap.25.l798
Abstract
1 µm-long vertical-type amorphous-silicon field-effect transistors with small parasitic elements have been fabricated and evaluated. Field-effect mobility, mutual conductance and input capacitance per unit channel width were 0.1 cm2/Vs,10 µS/mm and 0.55 pF/mm, respectively. Cut-off frequency evaluated from these values was 3 MHz.Keywords
This publication has 2 references indexed in Scilit:
- Two-Dimensional Numerical Analysis of Amorphous-Silicon Field-Effect TransistorsJapanese Journal of Applied Physics, 1985
- Proposed vertical-type amorphous-silicon field-effect transistorsIEEE Electron Device Letters, 1984