Gold silicide precipitates in silicon
- 1 February 1988
- journal article
- research article
- Published by Taylor & Francis in Philosophical Magazine Letters
- Vol. 57 (2) , 75-80
- https://doi.org/10.1080/09500838808229613
Abstract
This Letter describes the precipitation of gold in silicon from a highly supersaturated solution. After saturation of float-zone Si at 1275°C with gold, annealing experiments were performed at 850°C for various annealing times. By means of high-resolution electron microscopy, small particles (10–20 nm diameter) consisting of a metastable gold silicide were found. From selected-area diffraction patterns we deduce an orthorhombic unit cell with a = 0·960, b = 0·768 and c = 0·690 nm.Keywords
This publication has 2 references indexed in Scilit:
- Diffusion of gold in silicon studied by means of neutron-activation analysis and spreading-resistance measurementsApplied Physics A, 1984
- The structure of gold silicide in thin Au/Si filmsThin Solid Films, 1980