Ultra-flat InP substrates produced using a chemo-mechanical polishing technique
- 1 February 1987
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 80 (2) , 459-462
- https://doi.org/10.1016/0022-0248(87)90098-4
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- The chemical polishing of semiconductorsJournal of Materials Science, 1975
- Chemical etching of {1 1 1} and {1 0 0} surfaces of InPJournal of Materials Science, 1973
- Room Temperature Chemical Polishing of Ge and GaAsJournal of the Electrochemical Society, 1964
- A Polishing Etchant for III–V SemiconductorsJournal of the Electrochemical Society, 1962