Take‐off angle and film thickness dependences of the attenuation length of X‐ray photoelectrons by a trajectory reversal method
- 1 July 1990
- journal article
- data interpretation-and-quantification
- Published by Wiley in Surface and Interface Analysis
- Vol. 16 (1-12) , 149-153
- https://doi.org/10.1002/sia.740160129
Abstract
No abstract availableKeywords
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