Process Windows of Nickel and Platinum Silicides in Deep Sub-Micron Regime
- 1 January 1995
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Thermal Stability of Platinum Silicide in Deep Sub-Micron LinesMRS Proceedings, 1995
- Thickness dependence of the properties and thermal stability of PtSi filmsThin Solid Films, 1994
- Analysis of resistance behavior in Ti- and Ni-salicided polysilicon filmsIEEE Transactions on Electron Devices, 1994
- A Titanium Salicide Process Suitable for Submicron CMOS ApplicationsMRS Proceedings, 1993
- Formation of Chemically Clean and Morphologically Smooth PtSi/Si InterfacesMRS Proceedings, 1993