Fabrication of low-temperature PECVD channel waveguides with significantly improved loss in the 1.50-1.55-μm wavelength range
- 1 July 1995
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Photonics Technology Letters
- Vol. 7 (7) , 774-776
- https://doi.org/10.1109/68.393202
Abstract
By excluding nitrogen-containing gases from the deposition process, silica-based waveguides have been fabricated by PECVD at low temperature with a propagation loss less than 0.2 dB/cm in the 1.50-1.55-μm wavelength range. PECVD is performed in a high-plasma-density hollow cathode system from a mixture of oxygen and silane. Carbon tetrafluoride is used as a fluorine dopant to depress the refractive index in the buffer and cladding layers. A controllable refractive index change in the range 0.004-0.02 can be obtained.Keywords
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