Dissolution inhibition-type photoresists for deep-UV lithography
- 30 June 1992
- journal article
- Published by Elsevier in Progress in Organic Coatings
- Vol. 20 (3-4) , 289-300
- https://doi.org/10.1016/0033-0655(92)80020-w
Abstract
No abstract availableKeywords
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- Advances in the design of organic resist materialsMicroelectronic Engineering, 1983
- JellyfishNature, 1974