Comments on ‘The influence of sputtering and transport mechanisms on target etching and thin film growth in rf systems’
- 1 May 1973
- Vol. 23 (5) , 175
- https://doi.org/10.1016/0042-207x(73)91345-6
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- The influence of sputtering and transport mechanisms on target etching and thin film growth in rf systems—II. Transport and deposition processesVacuum, 1972
- The influence of sputtering and transport mechanisms on target etching and thin film growth in rf systems—I. Target processesVacuum, 1972
- The Interaction of Photoresists with Metals and Oxides during RF Sputter-EtchingJournal of the Electrochemical Society, 1972
- Sputter-etching of Heterogeneous SurfacesIBM Journal of Research and Development, 1972
- Control of Film Properties by rf-Sputtering TechniquesJournal of Vacuum Science and Technology, 1971