Fabrication of narrow-band-gap hydrogenated amorphous silicon by chemical annealing
- 1 August 1998
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 84 (3) , 1333-1339
- https://doi.org/10.1063/1.368202
Abstract
No abstract availableThis publication has 20 references indexed in Scilit:
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