Amorpiious Silicon Thin Film Transistor and its Applications to Large-Area Electironics

This publication has 17 references indexed in Scilit:

• Direct Observation of the Movement of Vertical Bloch Lines in Ho–Co Sputter-Deposited Films
  Japanese Journal of Applied Physics, 1983
• The characteristics and properties of optimised amorphous silicon field effect transistors
  Applied Physics A, 1983
• Electrical Properties of Polycrystalline Silicon MOSFETs on Glass
  Japanese Journal of Applied Physics, 1983
• Amorphous-silicon/silicon-oxynitride field-effect transistors
  Applied Physics Letters, 1982
• Thermal Behavior of B, P and As Atoms in Supersaturated Si Produced by Ion Implantation and Pulsed-Laser Annealing
  Japanese Journal of Applied Physics, 1982
• Laser crystallization of Si films on glass
  Applied Physics Letters, 1982
• Amorphous silicon-silicon nitride thin-film transistors
  Applied Physics Letters, 1981
• Application of amorphous silicon field effect transistors in addressable liquid crystal display panels
  Applied Physics A, 1981
• Polycrystalline-silicon thin-film transistors on glass
  Applied Physics Letters, 1980
• Thin film MOSFET’s fabricated in laser-annealed polycrystalline silicon
  Applied Physics Letters, 1979