Resist materials for proton micromachining
- 1 September 1999
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 158 (1-4) , 179-184
- https://doi.org/10.1016/s0168-583x(99)00392-4
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
- Real three dimensional micro fabrication using stereo lithography and metal moldingPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- Focused high energy proton beam micromachining: A perspective viewNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1999
- Micromachining using focused high energy ion beams: Deep Ion Beam LithographyNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1999
- A high resolution beam scanning system for deep ion beam lithographyNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1998
- Nuclear microprobe analysis and imaging: Current state of the art performancesNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1998
- Micromachining using deep ion beam lithographyNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1997
- Microstereophotolithography using a liquid crystal display as dynamic mask-generatorMicrosystem Technologies, 1997
- Deep X-ray lithography for the production of three-dimensional microstructures from metals, polymers and ceramicsRadiation Physics and Chemistry, 1995
- The National University of Singapore nuclear microscope facilityNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1994
- Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming, and plastic moulding (LIGA process)Microelectronic Engineering, 1986