Characterization of TiN film grown by low-pressure-chemical-vapor-deposition
- 1 October 1997
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 308-309, 594-598
- https://doi.org/10.1016/s0040-6090(97)00493-8
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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