The end of the CMOS roadmap—new landscape beyond

This publication has 4 references indexed in Scilit:

• The future of interconnection technology
  IBM Journal of Research and Development, 2000
• A 20-nm physical gate length NMOSFET featuring 1.2 nm gate oxide, shallow implanted source and drain and BF₂ pockets
  IEEE Electron Device Letters, 2000
• Size dependence of the characteristics of Si single-electron transistors on SIMOX substrates
  IEEE Transactions on Electron Devices, 1996
• Physical limits in digital electronics
  Proceedings of the IEEE, 1975