Preparation of ZnO films by reactive evaporation
- 1 January 1994
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 237 (1-2) , 16-18
- https://doi.org/10.1016/0040-6090(94)90230-5
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
- Optical properties of spray deposited ZnO filmsSolid State Communications, 1991
- Études sur la croissance, la structure et la composition de couches minces de ZnO et ZnO dopé a l'indium, obtenues par procédé pyrosolThin Solid Films, 1991
- Preparation of ZnO films films by activated reactive evaporationSemiconductor Science and Technology, 1990
- Structural properties of ZnO films prepared by R.F. sputtering for optical applicationsThin Solid Films, 1989
- Optical properties of nonstoichiometric zinc oxide films deposited by bias sputteringJournal of Vacuum Science & Technology A, 1986
- Electrical and optical properties of zinc oxide thin films prepared by rf magnetron sputtering for transparent electrode applicationsJournal of Applied Physics, 1984
- The stability of zinc oxide transparent electrodes fabricated by R.F. magnetron sputteringThin Solid Films, 1984
- Optical and electrical properties of ZnO films prepared by spray pyrolysis for solar cell applicationsJournal of Vacuum Science and Technology, 1979
- Properties of thin films of zinc oxide prepared by a chemical spray methodJournal of Physics and Chemistry of Solids, 1970
- The Influence of Ambient Oxygen on the Electronic Conductivity of ZnO Thin FilmsJapanese Journal of Applied Physics, 1970