Nitridation of thin SiO2 films in N2 and NH3 plasmas
- 1 October 1987
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 30 (1-4) , 224-228
- https://doi.org/10.1016/0169-4332(87)90097-3
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
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