Measurement of damage distributions in ion bombarded Si, GaP and GaAs at 50 K
- 1 June 1976
- journal article
- Published by Elsevier in Nuclear Instruments and Methods
- Vol. 135 (3) , 489-495
- https://doi.org/10.1016/0029-554x(76)90063-x
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Comparison of measured and calculated damage distributions for light keV ion bombardment of solid surfacesNuclear Instruments and Methods, 1976
- Stopping cross sections and backscattering factors for 4He ions in matter Z = 1–92, E(4He) = 400–4000 keVAtomic Data and Nuclear Data Tables, 1974
- Some new aspects for the evaluation of disorder profiles in silicon by backscatteringRadiation Effects, 1973
- Stopping power of energetic helium ions transmitted through thin silicon crystals in channelling and random directionsRadiation Effects, 1972
- Spatial distribution of defects in ion bombarded silicon and germaniumRadiation Effects, 1971
- Analysis of disorder distributions in boron implanted siliconRadiation Effects, 1970
- Defect studies in crystals by means of channelingCanadian Journal of Physics, 1968
- Channeling of medium-mass ions through siliconCanadian Journal of Physics, 1968
- Energy Dissipation by Ions in the kev RegionPhysical Review B, 1961
- XXXIX. On the α particles of radium, and their loss of range in passing through various atoms and moleculesJournal of Computers in Education, 1905