Fabrication of nanocontacts for molecular devices using nanoimprint lithography
- 1 March 2002
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 20 (2) , 665-667
- https://doi.org/10.1116/1.1463068
Abstract
We present a simple process to fabricate gold nanocontacts with a gap as small as sub-10 nm. This method uses a two-step process of nanoimprint lithography (NIL) and electromigration. First, 20 nm wide gold nanowires were fabricated by NIL on a silicon dioxide substrate. Then by passing an electric current through a nanowire, the nanowire is split into two wires with a gap as small as sub-10 nm by electromigration. This fabrication method offers a fast and effective process for producing large numbers of nanocontacts for use in molecular self-assembly, and thus greatly enhances the probability of successful capture of single molecules.Keywords
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