Low-temperature migration of silicon through metal films importance of silicon-;metal interface
- 16 October 1971
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 7 (2) , 401-406
- https://doi.org/10.1002/pssa.2210070212
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- LOW-TEMPERATURE MIGRATION OF SILICON IN THIN LAYERS OF GOLD AND PLATINUMApplied Physics Letters, 1971
- Alpha-Particle Stopping Cross Section in Solids from 400 keV to 2 MeVPhysical Review B, 1969
- EFFECT OF CRYSTAL ORIENTATION ON OXIDATION RATES OF SILICON IN HIGH PRESSURE STEAMThe Journal of Physical Chemistry, 1961