Detection of alignment signals for focused ion beam lithography
- 1 May 1985
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 46 (9) , 898-900
- https://doi.org/10.1063/1.95880
Abstract
A detector and the output signal waveforms to be used for alignment in focused ion beam lithography are discussed. It is shown that a microchannelplate (MCP) is suitable for alignment signal detection. Alignment signals for 200-keV Si, 200-keV Be, and 100-keV Au ion beams are studied using the MCP. No deformation of alignment marks is observed in the case of light ions such as Si or Be. As a result, it is demonstrated that alignment can potentially be performed by detecting secondary electrons from the marks.Keywords
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