All-dry vacuum submicron lithography
- 1 March 1983
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 101 (4) , 369-372
- https://doi.org/10.1016/0040-6090(83)90103-7
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- All Dry Lithography Processes and Mechanistic Studies with Poly(methacrylonitrile) and Related PolymersJournal of the Electrochemical Society, 1981
- Inorganic resist for dry processing and dopant applicationsJournal of Vacuum Science and Technology, 1979
- A novel inorganic photoresist utilizing Ag photodoping in Se-Ge glass filmsApplied Physics Letters, 1976