Electron resists prepared from colloidal dispersions of poly(methyl methacrylate) in non-solvents
- 31 December 1980
- Vol. 21 (12) , 1356-1357
- https://doi.org/10.1016/0032-3861(80)90129-9
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Electron irradiation of poly(olefin sulfones). Application to electron beam resistsJournal of Applied Polymer Science, 1973
- Electron Beam Exposure of Polymeric ResistsJournal of Vacuum Science and Technology, 1972
- Electron Beam Fabrication of Micron TransistorsIBM Journal of Research and Development, 1971
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