Electronic and optical properties of glow-discharge amorphous silicon-carbon alloys
- 1 May 1984
- journal article
- Published by Taylor & Francis in Philosophical Magazine Part B
- Vol. 49 (5) , 489-501
- https://doi.org/10.1080/13642818408227657
Abstract
Measurements are reported on the optical gap, dark conductivity and photoconductivity of hydrogenated amorphous silicon-carbon films (a-SiC : H) prepared from the glow-discharge decomposition of silane-methane mixtures in He for gas compositions g= (SiH4)/(SiH4 + CH4) between 1 and 0. The optical gap Eg goes through a maximum at g ∼ 0·35 and the slope of the absorption edge decreases continuously as g is decreased from 1 to 0. The dark conductivity of the alloys, and also of a-C : H has been measured in the temperature range 300–470 K. Two conduction regimes are observed: extended-state conduction with an activation energy close to Eg/2 at high temperatures and hopping conduction in the conduction band tail at low temperatures. In the latter regime a well-defined activation energy is observed and from the change in the activation energy at the temperature of the transition, T B ∼ 350 K, we conclude that the conduction band tail width ΔE increases continuously when the carbon concentration is increased up to g ∼ 0·25–0·30. The conductivity data in both regimes are found to follow the Meyer-Neldel rule. Finally, it is shown that the photoconductivity efficiency is decreased by about eight orders of magnitude when g decreases from 1 to 0, and that the temperature dependence of the photocurrent is thermally activated with an activation energy of 0·34 ± 0·2 eV between 293 and 400 K. The behaviour of carbon-rich samples is discussed in terms of known structural properties.Keywords
This publication has 30 references indexed in Scilit:
- Electronic properties of hydrogenated amorphous silicon-germanium alloysJournal de Physique, 1983
- Properties of hydrogenated amorphous carbon films and the effects of dopingPhilosophical Magazine Part B, 1982
- Effect of hydrogenation on the electrical conductivity of amorphous silicon carbideSolid State Communications, 1982
- Behavior of Plasmons in an Amorphous Silicon-Carbon Alloy System Studied by X-Ray Photoelectron SpectroscopyPhysical Review Letters, 1981
- Reaction mechanisms in plasma deposition of SixC1-x:H filmsThin Solid Films, 1981
- Infrared absorption of hydrogenated amorphous SiC and GeC filmsThin Solid Films, 1980
- Control of Optical Gap in a-SixC1-x: H Alloy Films Produced by Reactive Sputtering MethodJapanese Journal of Applied Physics, 1980
- Reactive plasma deposited SixCyHz filmsThin Solid Films, 1979
- Photoluminescence in the amorphous system SixC1−xApplied Physics Letters, 1978
- Electrical and optical properties of amorphous silicon carbide, silicon nitride and germanium carbide prepared by the glow discharge techniquePhilosophical Magazine, 1977