Determination of stoichiometry of SiOx thin films using an Auger parameter
- 1 June 1992
- journal article
- research article
- Published by Elsevier in Thin Solid Films
- Vol. 213 (2) , 158-159
- https://doi.org/10.1016/0040-6090(92)90276-h
Abstract
No abstract availableKeywords
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