Fast deposition of amorphous carbon and silicon layers
- 1 May 1993
- journal article
- Published by Elsevier in Journal of Nuclear Materials
- Vol. 200 (3) , 430-433
- https://doi.org/10.1016/0022-3115(93)90322-p
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Plasma deposited carbon films as a possible means for divertor repairThin Solid Films, 1992
- Emission spectroscopy on a supersonically expanding argon/silane plasmaJournal of Applied Physics, 1992
- Carbon deposition using an expanding cascaded arc d.c. plasmaSurface and Coatings Technology, 1991
- Thick Carbon Deposition by Cascaded ArcsFusion Technology, 1991