Quantification of sputter depth profiles by means of wedge crater sputtering—a new technique for depth scale calibration
- 1 November 1988
- journal article
- research article
- Published by Wiley in Surface and Interface Analysis
- Vol. 13 (2-3) , 167-172
- https://doi.org/10.1002/sia.740130209
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Depth profiling on a sputtered bevel of sub-degree slope angleSurface and Interface Analysis, 1985
- Quantitative characterization of surface layers on corroded medieval window glass with SIMSAnalytical and Bioanalytical Chemistry, 1984
- In-Situ Laser Measurements of Sputter Rates During SIMS/AES In-Depth ProfilingPublished by Springer Nature ,1984
- Matrix calibration for the quantitative analysis of layered semiconductors by secondary ion mass spectrometryAnalytical Chemistry, 1983
- Sputter Depth Profiling of Microelectronic StructuresJournal of the Electrochemical Society, 1983
- The depth resolution of composition-depth profiles obtained by ball-cratering and Auger electron spectroscopyVacuum, 1981
- Crater edge profling of Ni/Cr sandwich multilayer thin films by scanning Auger microscopy (sam)Surface and Interface Analysis, 1980
- Quantitative depth profiling in surface analysis: A reviewSurface and Interface Analysis, 1980
- Composition–Depth profiling and interface analysis of surface coatings using ball cratering and the scanning auger microprobeSurface and Interface Analysis, 1979
- Auger electron spectroscopy depth profiling of Ni/Cr multilayers by sputtering with N2+ ionsThin Solid Films, 1979