Diffusion of gold in relaxed Si–Ge epi-layers
- 15 December 1999
- journal article
- Published by Elsevier in Physica B: Condensed Matter
- Vol. 273-274, 598-602
- https://doi.org/10.1016/s0921-4526(99)00582-7
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Diffusion, solubility, and thermodynamic properties of gold in solid germanium studied by means of radiotracer and spreading-resistance analysisJournal of Applied Physics, 1991
- Diffusion and solubility of copper, silver, and gold in germaniumPhysical Review B, 1991
- The Interplay of Solute- and Self-Diffusion - A Key for Revealing Diffusion Mechanisms in Silicon and GermaniumDefect and Diffusion Forum, 1991
- Interstitial-Substitutional Diffusion in Group III-V and Group IV Semiconductors: The Role of DislocationsDefect and Diffusion Forum, 1991
- Strahlungsofen für Kurzzeitglühungen — Aufbau, Funktionsweise und Testuntersuchungen an amorphem Fe40Ni40B20Vakuum in Forschung und Praxis, 1990
- Diffusion and solubility of copper in germaniumJournal of Applied Physics, 1985
- Simulation of critical IC fabrication processes using advanced physical and numerical methodsIEEE Transactions on Electron Devices, 1985
- Mechanism and kinetics of the diffusion of gold in siliconApplied Physics A, 1980
- Diffusion of Ge in SiGe alloysPhysical Review B, 1974
- Mechanism of Diffusion of Copper in GermaniumPhysical Review B, 1956