A Standard Sample Preparation Method for the Determination of Metal Impurities on a Silicon Wafer by Total Reflection X-Ray Fluorescence Spectrometryt
- 11 June 1995
- journal article
- Published by Springer Nature in Analytical Sciences
- Vol. 11 (3) , 499-504
- https://doi.org/10.2116/analsci.11.499
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Quantitative Analysis of Surface Contaminations on Si Wafers by Total Reflection X-Ray FluorescenceJapanese Journal of Applied Physics, 1992
- A Method of Quantitative Contamination with Metallic Impurities of the Surface of a Silicon WaferJapanese Journal of Applied Physics, 1988
- Concentration Profile of a Dissolved Polymer near the Air-Liquid Interface: X-Ray Fluorescence StudyPhysical Review Letters, 1985
- Surface Studies of Solids by Total Reflection of X-RaysPhysical Review B, 1954